巴尔查斯 BALZERS UMS 500 超高真空蒸发设备用途：适用于半导体、材料研究、光学等领域。可用于制备超导薄膜、金属与有机材料薄膜等，在半导体芯片制造中进行关键薄膜沉积，助力材料研究开发新型材料，以及在光学元件上镀制功能薄膜 。性能：为批量式钟罩型设备，配备内部加热器和负载锁装置。可达到的基础压力分别为5×10−10毫巴和1×10−8毫巴 。工艺腔室设有带背面基板加热器（最高达900∘C）的三工位晶圆支架、石英厚度监测仪和四极质谱仪。配备两个 15kW 电子束蒸发枪（Balzers ESQ 300 U）用于蒸发金属，如铜和钇，电子束枪通过调节发射电流和束聚焦来控制速率。采用 Mo 舟蒸发钡。氧气通过 UHV 定量给料阀 UDV 135 引入，并由热阀控制器 RVG 050 控制。特殊屏蔽的四极质量分析仪 QMA 400 和控制器接口 QMG 420 以每秒 12 次的速率依次测量三种材料的通量和氧气分压 。

Product Name: BALZERS UMS 500 Ultra High Vacuum Evaporation EquipmentPurpose: It is suitable for fields such as semiconductors, materials research, and optics. It can be used to prepare superconducting thin films, metal and organic material thin films, etc. It deposits key thin films in semiconductor chip manufacturing, helps materials research to develop new materials, and coats functional thin films on optical components.Performance: It is a batch-type bell jar equipment, equipped with internal heaters and a load lock device. The achievable base pressures are 5×10−10 mbar and 1×10−8 mbar respectively. The process chamber is equipped with a three-station wafer holder with a backside substrate heater (up to 900∘C), a quartz thickness monitor, and a quadrupole mass spectrometer. It is equipped with two 15kW electron beam evaporation guns (Balzers ESQ 300 U) for evaporating metals such as copper and yttrium. The electron beam guns control the rate by adjusting the emission current and beam focus. Barium is evaporated from a Mo-boat. Oxygen is introduced through an UHV dosing valve UDV 135 and controlled by a thermovalve controller RVG 050. A specially shielded quadrupole mass analyzer QMA 400 and a controller interface QMG 420 measure the flux of the three materials and the partial pressure of oxygen sequentially at a rate of 12 times per second.