AIRCO TEMESCAL BJD - 1800 电子束蒸发器用途：专为研发应用中的金属薄膜沉积而设计。可在多种基底上沉积电镀基层，例如硅片、用于转移掩模应用的有机玻璃（PMMA）片以及用于制作 X 射线掩模原型的聚酰亚胺薄膜等 。性能：系统主要组件包括一个带基板支架的不锈钢高真空腔室，能固定基板。配备由机械泵、扩散泵和自动联锁装置组成的抽气系统。电子束源可容纳 6 种不同靶材。拥有 4 个用于蒸发工艺的凹槽。清洁腔室经长时间抽气后，基础压力可达 10⁻⁸托范围。源腔室直径 18 英寸、高 18 英寸，采用 304 不锈钢材质并水冷。源托盘为直径 18 英寸的平板，带有 10 个直径 1 英寸的馈通端口 。

Product Name: AIRCO TEMESCAL BJD - 1800 Electron Beam EvaporatorPurpose: It is specifically designed for thin metal film deposition in research and development applications. It can deposit electroplating base layers on a variety of substrates, such as silicon wafers, plexiglass (PMMA) wafers for transfer mask applications, and kapton for prototype X - ray mask fabrication.Performance: The main components of the system include a stainless - steel high - vacuum chamber with a substrate holder to fix the substrate. It is equipped with a pumping system consisting of a mechanical pump, a diffusion pump, and automated interlocks. The electron beam source can accommodate 6 different targets. It has 4 pockets for evaporation processes. After an extended pump - down time, the base pressure in the clean chamber can reach the range of 10⁻⁸ torr. The source chamber is 18 inches in diameter and 18 inches high, made of 304 stainless steel and water - cooled. The source tray is an 18 - inch - diameter flat plate with 10 1 - inch - diameter feedthrough ports.