爱发科 ULVAC EBX - 2000C用途：这是一款高真空蒸发系统，主要用于在基板上沉积各类薄膜材料。在材料研究领域，助力科研人员制备新型薄膜材料，探究其特性；在半导体制造中，可用于芯片生产过程里金属电极、绝缘层等薄膜的沉积；在光学行业，能够制备增透膜、反射膜等光学薄膜，提升光学元件性能 。性能：设备底面中央设有两个电弧放电蒸发源，AC 与 DC 模式可切换使用，电弧放电电流值在 0 - 500A 范围可变 。放电角度能在 0° 至 45° 间调节。可搭载最大直径 5 英寸的基板 4 枚，基板角度在 30° - 60° 范围可变，且能绕垂直轴旋转，以此提高膜厚分布均匀度。配备水晶发信式膜厚计实时监测膜厚。两侧的电阻蒸发源用于剥离剂蒸镀 。

Product Name: ULVAC EBX - 2000CPurpose: This is a high - vacuum evaporation system mainly used for depositing various thin - film materials on substrates. In the field of materials research, it helps researchers prepare new thin - film materials and explore their properties. In semiconductor manufacturing, it can be used for the deposition of thin films such as metal electrodes and insulating layers during chip production. In the optical industry, it can prepare optical films such as anti - reflection coatings and reflective coatings to improve the performance of optical components.Performance: There are two arc - discharge evaporation sources in the center of the bottom surface of the equipment. The AC and DC modes can be switched. The arc - discharge current value can be varied in the range of 0 - 500A. The discharge angle can be adjusted from 0° to 45°. It can carry 4 substrates with a maximum diameter of 5 inches. The substrate angle can be varied in the range of 30° - 60° and can rotate around the vertical axis to improve the uniformity of film - thickness distribution. It is equipped with a crystal - oscillator film - thickness monitor to monitor the film thickness in real - time. The resistance evaporation sources on both sides are used for the evaporation of release agents.