FULINTEC FU - 16PEB 电子束蒸镀系统用途：属于电子束蒸镀设备，常用于材料表面处理。可在半导体、光学等领域，于硅片、玻璃等基底上蒸镀金属（如纯度 99.9995% 的纯 Al）及合金薄膜。例如在集成电路制造中，为芯片电极沉积金属层；在光学元件生产中，镀制特定功能的薄膜 。性能：可处理一定尺寸的基底材料。从相关实验可知，其蒸发条件为真空度达 5×10⁻⁶Torr ，能精准控制。衬底温度可保持在 40 - 50℃，沉积速率稳定在 1nm/s，利于制备高质量、均匀性佳的薄膜。

Product Name: FULINTEC FU - 16PEB Electron Beam Evaporation SystemPurpose: It belongs to an electron beam evaporation device and is often used for material surface treatment. It can deposit metal (such as pure Al with a purity of 99.9995%) and alloy thin films on substrates such as silicon wafers and glass in the semiconductor and optical fields. For example, in integrated circuit manufacturing, it deposits metal layers for chip electrodes; in the production of optical components, it deposits thin films with specific functions.Performance: It can process substrate materials of a certain size. From relevant experiments, its evaporation conditions can reach a vacuum degree of 5×10⁻⁶Torr, which can be precisely controlled. The substrate temperature can be maintained at 40 - 50°C, and the deposition rate is stable at 1nm/s, which is conducive to preparing high - quality and uniform thin films.