AIRCO TEMESCAL FC 1800 电子束蒸发器用途：适用于科研及工业领域的薄膜制备。在科研中，常用于新材料研发，可在各类基底上沉积金属、合金或化合物薄膜，助力探索材料新特性；工业上，能为半导体、光学器件等产品制造，提供高精度的薄膜沉积服务，如在硅片表面沉积金属电极薄膜 。性能：设备采用 18 英寸直径的水冷不锈钢腔室，保障蒸发环境稳定。配备 6 口袋坩埚系统，无需打开腔室即可沉积多种薄膜。拥有可编程的电子枪 X - Y 扫描控制器，可精确控制电子束走向。搭配 2 千瓦的基板加热灯组件及欧陆比例控制器，能精准调控基板温度。系统基础压力优于 1x10⁻⁷托，确保薄膜沉积过程不受杂质干扰 。

Product Name: AIRCO TEMESCAL FC 1800 Electron Beam EvaporatorPurpose: It is suitable for thin - film preparation in scientific research and industrial fields. In scientific research, it is often used in the research and development of new materials. It can deposit metal, alloy, or compound thin films on various substrates, helping to explore new material properties. In industry, it can provide high - precision thin - film deposition services for the manufacturing of semiconductor and optical devices, such as depositing metal electrode thin films on the surface of silicon wafers.Performance: The equipment uses an 18 - inch - diameter water - cooled stainless - steel chamber to ensure a stable evaporation environment. It is equipped with a six - pocket crucible system, which can deposit a variety of thin films without opening the chamber. It has a programmable electron gun X - Y sweep controller to precisely control the direction of the electron beam. It is equipped with a 2 - kilowatt substrate heating lamp assembly and a Eurotherm proportional controller to accurately regulate the substrate temperature. The base pressure of the system is better than 1x10⁻⁷ torr, ensuring that the thin - film deposition process is not interfered with by impurities.