AMAT/APPLIED MATERIALS ATON 1600/2 PREHT 预处理设备用途：主要用于半导体制造流程中的晶圆预处理环节，可有效去除晶圆表面的杂质、污染物以及自然氧化层等，为后续诸如化学气相沉积（CVD）、物理气相沉积（PVD）等关键工艺提供洁净且理想的晶圆表面，极大提升后续工艺的质量与稳定性 。性能：具备高精度的温度控制能力，温度精度可达 ±1℃，能精准调节工艺温度，满足不同预处理需求。气体流量控制精准，可精确调控各类反应气体流量，偏差控制在 ±1% 以内。设备处理效率较高，每小时能够处理大量晶圆，显著提升生产效率 。

Product Name: AMAT/APPLIED MATERIALS ATON 1600/2 PREHT Pretreatment EquipmentPurpose: It is mainly used for the wafer pretreatment process in the semiconductor manufacturing process. It can effectively remove impurities, contaminants, and the native oxide layer on the wafer surface, providing a clean and ideal wafer surface for subsequent key processes such as chemical vapor deposition (CVD) and physical vapor deposition (PVD), greatly improving the quality and stability of subsequent processes.Performance: It has high - precision temperature control ability, with a temperature accuracy of ±1°C, which can precisely adjust the process temperature to meet different pretreatment requirements. The gas flow control is precise, and the flow rates of various reaction gases can be accurately regulated with a deviation control within ±1%. The equipment has a high processing efficiency and can process a large number of wafers per hour, significantly improving production efficiency.