爱发科 ULVAC ei-5t用途：这是一款小型高真空蒸发设备，用于在基板表面沉积金属及氧化物薄膜。适用于实验室研发及小批量生产场景，可处理直径 2-4 英寸的圆形基板或小型矩形基板，兼容硅、玻璃、陶瓷等多种材质，在材料研究、光学元件制备等领域应用广泛。性能：采用紧凑设计，节省安装空间。支持电子束（EB）和电阻加热（RH）蒸发源，可实现精准薄膜沉积。配备真空计实时监测真空状态，极限真空度可达 1×10⁻⁴Pa 以下。通过简洁操作界面控制，具备基本的工艺参数调节功能，满足中小规模薄膜制备需求。

Product Name: ULVAC ei-5tPurpose: This is a small-sized high-vacuum evaporation equipment used for depositing metal and oxide thin films on substrate surfaces. Suitable for laboratory research and small-batch production scenarios, it can handle 2-4 inch diameter circular substrates or small rectangular substrates, compatible with various materials such as silicon, glass and ceramics, widely applied in material research and optical component preparation fields.Performance: Adopts compact design to save installation space. Supports electron beam (EB) and resistance heating (RH) evaporation sources for precise thin-film deposition. Equipped with vacuum gauge for real-time vacuum monitoring, with ultimate vacuum reaching below 1×10⁻⁴Pa. Controlled via simple operation interface, featuring basic process parameter adjustment functions to meet small and medium-scale thin-film preparation needs.