KURT J. LESKER PEDL18MTDHT001 设备用途：可能用于物理气相沉积（PVD）相关工艺，可在多种基底上沉积薄膜，常见于半导体、光学、材料研究、数据存储、显示技术、能源、医疗等领域，如用于制造 OLED 设备、太阳能电池、半导体晶圆等。性能：因缺乏具体型号参数，参考同品牌产品特性，推测其具备高精度的薄膜沉积能力，可实现稳定的沉积速率，搭配石英晶体监控器来精确监测沉积速率和厚度。能在高真空环境下运行，确保薄膜沉积的高质量与一致性 。

Product Name: KURT J. LESKER PEDL18MTDHT001 equipmentPurpose: It may be used for physical vapor deposition (PVD)-related processes. It can deposit thin films on a variety of substrates and is commonly seen in fields such as semiconductors, optics, materials research, data storage, display technology, energy, and medical. For example, it is used in the manufacturing of OLED devices, solar cells, semiconductor wafers, etc.Performance: Due to the lack of specific model parameters, referring to the characteristics of products of the same brand, it is speculated that it has a high-precision thin film deposition ability, can achieve a stable deposition rate, and is equipped with a quartz crystal monitor to accurately monitor the deposition rate and thickness. It can operate in a high-vacuum environment to ensure the high quality and consistency of thin film deposition.