LEYBOLD Pegasus Dis 2000V 溅射系统用途：该设备主要用于各类材料的薄膜沉积。在光学行业，可制造高反射率或增透的光学薄膜，应用于航天望远镜镜片等高端光学元件；在电子领域，能够为半导体芯片溅射特定薄膜，满足电路连接、绝缘等需求；也适用于其他对薄膜质量和性能有高要求的工业场景 。性能：具备较高的沉积效率，可实现快速薄膜制备。能精准控制薄膜厚度与均匀性，从而保证薄膜质量。虽然暂缺具体参数，但从品牌技术实力推测，其真空系统可能高效稳定，可快速达到并维持适合溅射的高真空环境；溅射功率调节装置精准，能精确调控薄膜生长速率，膜厚精度有望达纳米级 。

Product Name: LEYBOLD Pegasus Dis 2000V Sputtering SystemPurpose: This equipment is mainly used for thin - film deposition of various materials. In the optical industry, it can manufacture high - reflectivity or anti - reflection optical films, which are applied to high - end optical components such as space telescope lenses. In the electronics field, it can sputter specific films for semiconductor chips to meet the requirements of circuit connection and insulation. It is also suitable for other industrial scenarios with high requirements for film quality and performance.Performance: It has a high deposition efficiency and can achieve rapid thin - film preparation. It can precisely control the film thickness and uniformity, thus ensuring the film quality. Although specific parameters are temporarily unavailable, judging from the brand's technical strength, its vacuum system may be highly efficient and stable, capable of quickly reaching and maintaining a high - vacuum environment suitable for sputtering. The sputtering power adjustment device is accurate and can precisely regulate the film growth rate, and the film thickness accuracy is expected to reach the nanometer level.