GILITEK IBSV - 1100 - MC 离子束溅射真空系统用途：用于在各类材料基底上进行高质量薄膜沉积，适用于半导体、光学、太阳能等行业。能在玻璃、硅片等基底上沉积金属、陶瓷、氧化物等薄膜，以满足不同领域对薄膜材料的功能性需求，如光学镜片的增透膜、半导体器件的电极膜等。性能：虽暂未获取具体参数，但从品牌特性推测，该系统可能具备高真空环境构建能力，保障薄膜沉积的高质量与高纯度。拥有精准的离子束控制技术，可实现对薄膜沉积速率和厚度的精确调控，确保薄膜均匀性良好，能为不同应用场景提供稳定可靠的薄膜制备方案 。

Product Name: GILITEK IBSV - 1100 - MC Ion Beam Sputtering Vacuum SystemPurpose: It is used for high - quality thin - film deposition on various material substrates and is applicable to industries such as semiconductors, optics, and solar energy. It can deposit thin films of metals, ceramics, oxides, etc. on substrates such as glass and silicon wafers to meet the functional requirements for thin - film materials in different fields, such as anti - reflection films for optical lenses and electrode films for semiconductor devices.Performance: Although specific parameters have not been obtained yet, inferring from the brand characteristics, this system may have the ability to create a high - vacuum environment to ensure the high quality and high purity of thin - film deposition. It has precise ion beam control technology, which can achieve accurate regulation of the thin - film deposition rate and thickness, ensuring good film uniformity and providing a stable and reliable thin - film preparation solution for different application scenarios.