爱发科 ULVAC SDP - 651HM用途：这是一款在半导体、光学、平板显示等行业应用的溅射设备。在半导体制造流程中，可完成芯片金属电极、绝缘层等薄膜的溅射沉积工作；在光学领域，能够实现光学镜片增透膜、反射膜等的制备；在平板显示产业，助力透明导电膜等关键薄膜的生产 。性能：虽暂时没有公开的具体参数，但根据爱发科的技术能力推测，该设备具备高效的真空系统，能够快速营造出高真空环境，为薄膜溅射提供稳定的基础条件。溅射源稳定性佳，可精准调控溅射速率，确保薄膜厚度均匀，厚度偏差极小。设备可能还配备了自动化的晶圆传送系统，以此实现高效的连续生产，提高整体生产效率 。

Product Name: ULVAC SDP - 651HMPurpose: This is a sputtering device used in industries such as semiconductors, optics, and flat panel displays. In the semiconductor manufacturing process, it can complete the sputter deposition of thin films such as metal electrodes and insulating layers in chips. In the optical field, it can achieve the preparation of anti - reflection coatings, reflective coatings, etc. on optical lenses. In the flat panel display industry, it helps in the production of key thin films such as transparent conductive films.Performance: Although specific public parameters are not available for the moment, based on ULVAC's technical capabilities, this device is inferred to have an efficient vacuum system that can quickly create a high - vacuum environment, providing stable basic conditions for thin - film sputtering. The sputtering source has good stability and can precisely control the sputtering rate, ensuring uniform film thickness with a minimal thickness deviation. The device may also be equipped with an automated wafer transfer system to achieve efficient continuous production and improve overall production efficiency.