爱发科 ULVAC SDP - 651用途：该设备为溅射类装置，在半导体、光学以及平板显示等行业应用广泛。于半导体制造环节，可用于芯片制造过程中金属电极、绝缘层等薄膜的溅射沉积；在光学领域，能够实现光学镜片增透膜、反射膜等的制备工作；在平板显示产业，助力透明导电膜等关键薄膜的生产 。性能：虽然暂未获取公开的具体参数，但基于爱发科的技术实力进行推测，它应具备高效的真空系统，能快速营造高真空环境，为薄膜溅射提供稳定的基础条件。其溅射源稳定性强，可精准调控溅射速率，保障薄膜厚度均匀，厚度偏差能控制在极小范围。设备可能还配备自动化的晶圆传送系统，以此来实现高效的连续生产，提升整体生产效率 。

Product Name: ULVAC SDP - 651Purpose: This device is a sputtering apparatus and is widely used in industries such as semiconductors, optics, and flat - panel displays. In semiconductor manufacturing, it can be used for the sputter deposition of thin films such as metal electrodes and insulating layers during chip manufacturing. In the optical field, it can be used to prepare anti - reflection coatings, reflective coatings, etc. on optical lenses. In the flat - panel display industry, it helps in the production of key thin films such as transparent conductive films.Performance: Although specific public parameters are not available for the moment, based on ULVAC's technical strength, it is inferred to have an efficient vacuum system that can quickly create a high - vacuum environment, providing a stable foundation for thin - film sputtering. Its sputtering source has strong stability and can precisely control the sputtering rate, ensuring uniform film thickness with a minimal thickness deviation. The device may also be equipped with an automated wafer transfer system to achieve efficient continuous production and improve overall production efficiency.