爱发科 ULVAC SIV - 500用途：这是一款真空溅射设备，适用于光学薄膜、半导体、LED、功率器件及 MEMS 等多个领域。可进行 SiO、SiN 等光学薄膜的溅射，也能用于金属溅射，比如在芯片制造中完成金属电极、绝缘层等薄膜的溅射沉积，助力相关产品的生产制造 。性能：采用用于抑制 particle 的通过型竖直溅射方式，支持基板往复或 line 式搬送。搭载静电吸附系统与更大的静电托盘，刻蚀速率高于常规设备，产能更大。配备 ULVAC SW - 1 皮拉尼真空计等测量系统，可精准监测真空度。拥有旋转泵等真空抽气系统，能快速营造稳定的真空环境。具备基板加热系统，包括加热机制、加热器电源与带过热热电偶的温度控制器 。

Product Name: ULVAC SIV - 500Purpose: This is a vacuum sputtering device suitable for multiple fields such as optical thin films, semiconductors, LEDs, power devices, and MEMS. It can perform sputtering of optical thin films such as SiO and SiN, and can also be used for metal sputtering. For example, it can complete the sputter deposition of thin films such as metal electrodes and insulating layers in chip manufacturing, contributing to the production and manufacturing of related products.Performance: It adopts a through - type vertical sputtering method for particle suppression and supports reciprocating or line - type substrate transfer. It is equipped with an electrostatic adsorption system and a larger electrostatic tray, with a higher etching rate and greater productivity than conventional equipment. It is equipped with a measurement system such as the ULVAC SW - 1 Pirani vacuum gauge to accurately monitor the vacuum degree. It has a vacuum pumping system such as a rotary pump to quickly create a stable vacuum environment. It has a substrate heating system, including a heating mechanism, a heater power supply, and a temperature controller with an overheating thermocouple.