ANELVA SPF-210H 射频平面磁控溅射设备用途：适用于材料科学研究与薄膜制备领域。常被用于制备压电 ZnO 薄膜，以应用于光波导和表面声波器件。也可用于沉积电解质薄膜，用于相关电池材料研究等 。性能：采用射频平面磁控溅射技术，具备高沉积速率。可使用直径 100mm 的靶材，如高纯度（99.99%）的 ZnO 陶瓷靶材，或掺杂锂的 ZnO 靶材。靶材放置在水冷铜板靶托上。在沉积电解质薄膜时，可在 Ar 和 O₂（1:1）的载气环境中进行溅射 。

Product Name: ANELVA SPF-210H RF Planar Magnetron Sputtering EquipmentPurpose: It is suitable for the fields of materials science research and thin - film preparation. It is often used to prepare piezoelectric ZnO films for applications in optical waveguides and surface acoustic wave devices. It can also be used to deposit electrolyte films for related battery material research, etc.Performance: It adopts RF planar magnetron sputtering technology and has a high deposition rate. Targets with a diameter of 100mm can be used, such as high - purity (99.99%) ZnO ceramic targets or ZnO targets doped with lithium. The target is placed on a water - cooled copper plate target holder. When depositing electrolyte films, sputtering can be carried out in a carrier gas environment of Ar and O₂ (1:1).