CHA SEC 1000 RAP 真空蒸发系统用途：适用于科研与工业领域，可在多种基底上沉积金属、合金及化合物薄膜，常用于半导体芯片制造、光学元件镀膜以及材料研究中的薄膜制备 。性能：基底板（一般 20 英寸）最多可配置 15 个用于仪器、控制和旋转运动的馈通。常搭配较大尺寸的钟罩与行星夹具，可容纳多片大尺寸晶圆。平均抽气时间较短，每小时能处理较多数量的晶圆。配备先进的晶体沉积监测仪，有自动或手动阀门控制选项。采用扩散泵和前级泵，搭配钟罩的电动提升装置，配备电子束电源及控制装置与带快门的电子枪 。

Product Name: CHA SEC 1000 RAP Vacuum Evaporation SystemPurpose: It is suitable for scientific research and industrial fields. It can deposit thin films of metals, alloys, and compounds on a variety of substrates. It is often used in semiconductor chip manufacturing, optical component coating, and thin - film preparation in materials research.Performance: The baseplate (usually 20 inches) can be equipped with up to 15 feedthroughs for instrumentation, control, and rotary motion. It is often paired with a relatively large - sized bell jar and a planetary fixture, which can hold multiple large - sized wafers. The average pump - down time is short, and it can process a relatively large number of wafers per hour. It is equipped with an advanced crystal deposition monitor and has options for automatic or manual valve control. It uses a diffusion pump and a roughing pump, along with a motorized hoist for the bell jar. It is equipped with an e - beam power supply and control device and an e - gun with a shutter.