MRC 903 桌面式溅射设备用途：这是一款先进的桌面式溅射设备，可实现高质量薄膜沉积，适用于光学镀膜、微机电系统（MEMS）、光电子学、专用集成电路（ASIC）器件等领域，能为相关产品制备所需的薄膜层 。性能：具备三轴溅射功能，拥有石墨源和可旋转的基板支架。配备 5 千伏晶体管溅射枪及含多达八条气路和两个真空阀的气箱。有用于溅射的高能电子枪及带平面靶的电子枪组件。拥有独特的三层一体化沉积腔室，可在不同电源和腔室条件下，同时进行多个靶材的溅射与蒸发。沉积腔室均匀性佳，沉积参数范围广，包括对腔室压力、温度、气体及电离水平的调控。用户界面可定制，能精确控制溅射过程。采用气动驱动的电动线性平台，确保靶材和基板精准移动与定位 。

Product Name: MRC 903 Desktop Sputtering EquipmentPurpose: This is an advanced desktop sputtering equipment that can achieve high - quality thin - film deposition. It is suitable for fields such as optical coatings, micro - electro - mechanical systems (MEMS), optoelectronics, and application - specific integrated circuit (ASIC) devices, and can prepare the required thin - film layers for related products.Performance: It has three - axis sputtering function, with a graphite source and a rotatable substrate holder. It is equipped with a 5 kV transistor sputter gun and a gas box with up to eight gas lines and two vacuum valves. There is a high - energy electron gun for sputtering and an electron gun assembly with a planar target. It has a unique three - level unitized deposition chamber that can simultaneously perform sputtering and evaporation of multiple targets under different power supplies and chamber conditions. The deposition chamber has good uniformity and a wide range of deposition parameters, including the regulation of chamber pressure, temperature, gas, and ionization levels. The user interface is customizable, allowing for precise control of the sputtering process. It adopts pneumatically - actuated, motorized linear stages to ensure precise movement and positioning of the target and the substrate.