DENTON VACUUM Explorer 14 磁控溅射镀膜系统用途：适用于科研和工业领域，可在半导体、光学、材料研究等方面发挥作用。能在各类基底上沉积金属、合金、氧化物等薄膜，用于制造芯片电极、光学镜片功能膜以及进行新材料研发等。性能：配备不锈钢真空室，尺寸为 18 英寸 ×18 英寸 ×12 英寸。有三个 3 英寸靶枪，可实现多种材料溅射。基片台可升温至 400℃（存在故障）且能旋转，尺寸达 6 英寸。极限真空能抽至 < 5e -7mbar 。可通过 Inficon 沉积控制器精确控制薄膜厚度，薄膜均匀性达 ±3% 。具备直流（DC）、脉冲直流（pulsed - DC）和射频（RF）溅射模式，支持共溅射 。

Product Name: DENTON VACUUM Explorer 14 Magnetron Sputtering Coating SystemPurpose: It is suitable for scientific research and industrial fields and can play a role in semiconductors, optics, materials research, etc. It can deposit thin films of metals, alloys, oxides, etc. on various substrates, which are used for manufacturing chip electrodes, functional films for optical lenses, and new material research.Performance: It is equipped with a stainless - steel vacuum chamber with dimensions of 18 inches×18 inches×12 inches. There are three 3 - inch target guns, enabling the sputtering of a variety of materials. The substrate stage can be heated to 400°C (with a malfunction) and can rotate, with a size of 6 inches. The ultimate vacuum can be pumped to <5e -7mbar. The film thickness can be precisely controlled through the Inficon deposition controller, and the film uniformity reaches ±3%. It has direct current (DC), pulsed direct current (pulsed - DC), and radio - frequency (RF) sputtering modes and supports co - sputtering.