DENTON VACUUM DESK IV 薄膜沉积系统用途：适用于材料研究、显微镜样本制备等领域，可在各类基底上沉积金属、半导体、聚合物、氧化物和氮化物等涂层材料，满足多样化薄膜制备需求。能进行 TEM 和 X 射线分析的高真空碳镀膜、SEM 分析的金溅射等。性能：极限真空可达 5×10⁻⁶托，采用 70L/sec 涡轮分子泵与油机械泵的真空系统。具备集成式触摸屏控制面板，可自动抽气、排气，也支持手动操作，能自动控制灯丝蒸发循环。配备 AC 辉光放电组件用于样品清洁，有厚度监测仪确保镀膜厚度精确。支持热蒸发与溅射工艺，样品台可倾斜、旋转，保障不规则样品表面镀膜的均匀性 。

Product Name: DENTON VACUUM DESK IV Thin Film Deposition SystemPurpose: It is suitable for fields such as materials research and microscope sample preparation. It can deposit coating materials like metals, semiconductors, polymers, oxides, and nitrides on various substrates, meeting diverse thin - film preparation needs. It can perform high - vacuum carbon coating for TEM and X - ray analysis, gold sputtering for SEM analysis, etc.Performance: The ultimate vacuum can reach 5×10⁻⁶ Torr, and it adopts a vacuum system with a 70L/sec turbomolecular pump and an oil mechanical pump. It has an integrated touch - screen control panel, which can automatically pump down and vent, and also supports manual operation. It can automatically control the filament evaporation cycle. It is equipped with an AC glow discharge assembly for sample cleaning and a thickness monitor to ensure accurate coating thickness. It supports thermal evaporation and sputtering processes. The sample stage can be tilted and rotated to ensure uniform coating on the surfaces of irregular samples.