巴尔查斯 BALZERS LLS EVO 物理气相沉积溅射系统用途：适用于半导体、光学、材料研究等领域。在半导体行业，常用于芯片制造中的薄膜沉积；光学领域可在镜片等元件上镀制功能性薄膜；材料研究方面，助力新型材料薄膜的实验与开发 。性能：具备线性平面磁控系统，设计简洁，靶材寿命长且种类丰富。能在原子尺度进行不同材料的混合镀膜，在旋转筒式操作中，可镀制如磁性器件所需的各向异性薄膜。支持 4 英寸、6 英寸晶圆。部分设备配有 Windows NT 操作系统、ENI PRG - 50E 电源、CTI Torr 8F 泵等，拥有 5 个靶材，靶材材料可选 AlCu、NiFe、Ni、Cr、Cu 等 。

Product Name: BALZERS LLS EVO Physical Vapor Deposition Sputtering SystemPurpose: It is suitable for fields such as semiconductors, optics, and materials research. In the semiconductor industry, it is often used for thin film deposition in chip manufacturing; in the optical field, it can coat functional thin films on components such as lenses; in materials research, it helps with the experiment and development of new material thin films.Performance: It has a linear planar magnetron system with a simple design, long target life, and a rich variety of targets. It can perform mixed coating of different materials at the atomic scale. In rotary drum operations, it can deposit anisotropic films required for magnetic devices, etc. It supports 4-inch and 6-inch wafers. Some devices are equipped with a Windows NT operating system, an ENI PRG - 50E power supply, a CTI Torr 8F pump, etc. It has 5 targets, and the target materials can be selected from AlCu, NiFe, Ni, Cr, Cu, etc.