https://rc0.zihu.com/g5/M00/41/1A/CgAGbGie_pyAZjsjAAJyFC0U7XY63.jpeg,https://rc0.zihu.com/g5/M00/41/1A/CgAGbGie_p-AHsuGAALGvSykT_I46.jpeg,https://rc0.zihu.com/g5/M00/41/1A/CgAGbGie_p-AT4k7AAIxCSbgFsA53.jpeg,https://rc0.zihu.com/g5/M00/41/1A/CgAGbGie_qCAEOJ7AAFLyaDWdAo87.jpeg
https://rc0.zihu.com/g5/M00/41/1A/CgAGbGie_pyAZjsjAAJyFC0U7XY63.jpeg
TRIKON Delta 201 等离子增强化学气相沉积系统(PECVD 系统)

库存状态:现货

TRIKON Delta 201用途:因缺乏普遍资料,推测它可能是半导体制造、材料加工等领域设备。若用于半导体制造,或可参与光刻、蚀刻、薄膜沉积等制程,助力芯片及相关电子元件生产;若在材料加工行业,也许能对各类材料进行表面处理、改性等操作 。性能:相关参数暂未公开。从同类设备推断,若为半导体设备,可能适配常见晶圆尺寸,如 8 英寸或 12 英寸。拥有精准的工艺控制能力,像在薄膜沉积中能精确调控膜厚、均匀性;若是材料加工设备,可能具备稳定的能量输出系统,保证处理过程的一致性与稳定性 。

Product Name: TRIKON Delta 201Purpose: Due to the lack of common information, it is speculated that it may be equipment in fields such as semiconductor manufacturing and material processing. If it is used in semiconductor manufacturing, it may be involved in processes such as lithography, etching, and thin - film deposition, contributing to the production of chips and related electronic components. If it is in the material processing industry, it may be able to perform surface treatment, modification, etc. on various materials.Performance: The relevant parameters have not been made public. Judging from similar equipment, if it is a semiconductor device, it may be compatible with common wafer sizes, such as 8 - inch or 12 - inch wafers. It has precise process control capabilities, such as being able to precisely control film thickness and uniformity in thin - film deposition. If it is a material processing device, it may have a stable energy output system to ensure the consistency and stability of the processing process.

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