SFI/SPUTTERED FILMS INC Endeavor 物理气相沉积系统用途：该系统主要用于在各类基板上进行高质量薄膜沉积。在半导体行业，可用于制造芯片时金属电极、绝缘层等薄膜的沉积；在光学领域，能够制备增透膜、反射膜等，提升光学元件性能；在 MEMS（微机电系统）制造中，为微结构表面提供功能性薄膜 。性能：可采用直流（DC）或交流（AC）溅射模式，具备独立的靶材控制系统。最多能处理直径 200mm 的基板。拥有多个处理腔室，例如，有的腔室可进行硅（Si）、氮化硅（SiN）、二氧化硅（SiO₂）、氮化铝（AlN）、氧化铝（Al₂O₃）等薄膜的 AC 溅射，AlN 沉积速率约 4.5nm/min，Al₂O₃约 6nm/min ，SiO₂约 4.5nm/min；有的腔室可进行钛（Ti）、氮化钛（TiN）、二氧化钛（TiO₂）、钨（W）及其氧化物等薄膜的 DC 溅射，Ti 沉积速率约 200nm/min ；还有的腔室可进行铝（Al）或金（Au）的 DC 溅射，Al 沉积速率约 300 - 400nm/min ，且具备射频（RF）反溅射功能用于样品清洁。基板最高可加热至 500°C 。
Product Name: SFI/SPUTTERED FILMS INC Endeavor Physical Vapor Deposition SystemPurpose: This system is mainly used for high - quality thin - film deposition on various substrates. In the semiconductor industry, it can be used for the deposition of thin films such as metal electrodes and insulating layers during chip manufacturing. In the optical field, it can prepare anti - reflection films, reflective films, etc., to improve the performance of optical components. In MEMS (Micro - Electro - Mechanical System) manufacturing, it provides functional films for the surface of microstructures.Performance: It can adopt direct current (DC) or alternating current (AC) sputtering modes, with an independent target control system. It can handle substrates with a maximum diameter of 200mm. It has multiple process chambers. For example, some chambers can perform AC sputtering of thin films such as silicon (Si), silicon nitride (SiN), silicon dioxide (SiO₂), aluminum nitride (AlN), aluminum oxide (Al₂O₃), etc. The deposition rate of AlN is about 4.5nm/min, Al₂O₃ is about 6nm/min, and SiO₂ is about 4.5nm/min. Some chambers can perform DC sputtering of thin films such as titanium (Ti), titanium nitride (TiN), titanium dioxide (TiO₂), tungsten (W) and its oxides. The deposition rate of Ti is about 200nm/min. There are also chambers that can perform DC sputtering of aluminum (Al) or gold (Au). The deposition rate of Al is about 300 - 400nm/min, and it has radio - frequency (RF) back - sputtering function for sample cleaning. The substrate can be heated up to 500°C.