LEYBOLD H3200 Cu / In 水平式在线溅射系统用途：用于在玻璃基板上连续沉积 Cu - In - Ga 等薄膜，是玻璃镀膜尤其是建筑玻璃镀膜的通用设备。可应用于太阳能电池制造、光学涂层等领域。性能：拥有 3 个大型工艺腔室与 8 个进出锁模块。三个 650mm 的模块在工艺中并排运行。设备搭载涡轮分子泵与旋片泵组合的真空系统，极限真空可达5×10−7mbar。设备整体尺寸为 24.335m x 4.30m ，重约 120 吨。可在较高的生产效率下，保证薄膜沉积的均匀性和高质量 。

Product Name: LEYBOLD H3200 Cu / In horizontal in-line sputtering systemPurpose: It is used for the continuous deposition of Cu - In - Ga and other thin films on glass substrates. It is a universal device for glass coating, especially architectural glass coating, and can be applied in fields such as solar cell manufacturing and optical coating.Performance: It has 3 large process chambers and 8 lock-in and lock-out modules. Three 650mm modules run side by side in the process. The equipment is equipped with a vacuum system combined with a turbomolecular pump and a rotary vane pump, and the ultimate vacuum can reach 5×10−7 mbar. The overall size of the equipment is 24.335m x 4.30m, and it weighs about 120 tons. It can ensure the uniformity and high quality of thin film deposition under high production efficiency.