巴尔查斯 BALZERS Clusterline 200 物理气相沉积设备用途：为半导体、光学及材料研究等领域打造。可在各类基底上精准沉积金属、合金及化合物薄膜，适用于制备半导体芯片的关键薄膜、光学元件的功能性薄膜，也助力材料研究中的薄膜实验 。性能：为全自动 200mm 集群式设备，配置单腔体或批量式处理模块。支持溅射、刻蚀和 PECVD 工艺。配备先进的圆形平面磁控系统，靶材直径范围广，利用旋转磁场实现全平面侵蚀，优化靶材利用率。运用专利磁场控制技术，确保薄膜均匀性。能精准调控工艺参数，实现高质量、高稳定性的薄膜沉积 。

Product Name: BALZERS Clusterline 200 Physical Vapor Deposition EquipmentPurpose: It is designed for fields such as semiconductors, optics, and materials research. It can accurately deposit thin films of metals, alloys, and compounds on various substrates, suitable for preparing key thin films for semiconductor chips, functional thin films for optical components, and also assisting in thin - film experiments in materials research.Performance: It is a fully - automated 200mm cluster - type equipment, equipped with single - cavity or batch - type processing modules. It supports sputtering, etching, and PECVD processes. It is equipped with an advanced round planar magnetron system with a wide range of target diameters. The rotating magnetic field is used to achieve full - face erosion and optimize target utilization. Patented magnetic field control technologies are applied to ensure film uniformity. It can precisely adjust process parameters to achieve high - quality and high - stability thin - film deposition.