爱德华 EDWARDS E306A 高真空热蒸发镀膜系统用途：属于物理气相沉积（PVD）设备，适用于在熔点或软化点高于 300℃的基底材料上，蒸发金属薄膜。常用于半导体、光学等领域的薄膜制备，如半导体芯片制造中的金属电极镀膜，光学镜片的反射膜、增透膜制备等。性能：作为行业标准设备，具备高真空环境营造能力，保障薄膜沉积的高质量与高纯度。虽暂未获取到详细参数，但从其定位推测，可精确控制蒸发过程，实现对薄膜厚度和均匀性的精准调控，满足不同应用场景对薄膜质量的严格要求。

Product Name: EDWARDS E306A High Vacuum Thermal Evaporation Coating SystemPurpose: It belongs to a physical vapor deposition (PVD) device and is suitable for evaporating metal films on substrate materials with a melting point or softening point higher than 300°C. It is often used for thin - film preparation in semiconductor, optical and other fields, such as the coating of metal electrodes in semiconductor chip manufacturing and the preparation of reflective films and anti - reflection films for optical lenses.Performance: As an industry - standard device, it has the ability to create a high - vacuum environment to ensure the high quality and high purity of thin - film deposition. Although detailed parameters have not been obtained yet, inferring from its positioning, it can precisely control the evaporation process to achieve precise regulation of the film thickness and uniformity, meeting the strict requirements for film quality in different application scenarios.