巴尔查斯 BALZERS BAS 450 物理气相沉积（PVD）设备910。用途：主要用于工具涂层，适用于小批量到中等数量的高负荷精密零部件，可应用于切割、成型、冲压、金属压铸或塑料加工等领域9。也可用于科研机构，进行薄膜材料的研发与小批量制备，能制备超导薄膜、半导体薄膜等11。性能：具备先进的 PVD 技术，可结合高电离电弧、HiPIMS 磁控溅射技术与 AEGD 蚀刻技术9。功率密度可在数百 W/cm² 到数千 W/cm² 范围内调节，以形成新的涂层结构9。AEGD 蚀刻效率高，在硬质合金工具基体上可达 2µm/h 的刻蚀效率9。设备具有模块化和灵活性，可进行扩展和升级，能在一个工艺过程中实现等离子氮化和随后的 PVD 镀膜的 2 合 1 工艺9。

Product Name: BALZERS BAS 450 Physical Vapor Deposition (PVD) Equipment910.Purpose: It is mainly used for tool coating, suitable for small - to medium - quantity high - load precision components, and can be applied to cutting, forming, stamping, die - casting or plastic processing fields9. It can also be used in research institutions for the research, development and small - batch preparation of thin - film materials, and can prepare superconducting films, semiconductor films, etc11.Performance: It is equipped with advanced PVD technology, which can combine high - ionization arc, HiPIMS magnetron sputtering technology and AEGD etching technology9. The power density can be adjusted in the range of hundreds to thousands of W/cm² to form new coating structures9. The AEGD etching efficiency is high, which can reach an etching efficiency of 2µm/h on cemented carbide tool substrates9. The equipment is modular and flexible, and can be expanded and upgraded. It can realize a 2 - in - 1 process of plasma nitriding and subsequent PVD coating in one process9.