爱发科 ULVAC EI - 5用途：这是一款高真空蒸发系统，用于在多种基板上沉积金属和氧化物薄膜。能实现单层膜或多种材料堆叠膜（如共电子束蒸发）的制备，适用于材料研究、半导体制造、光学元件制备等领域，例如在半导体芯片制造中用于沉积金属电极，在光学镜片生产中用于制备光学薄膜 。性能：可通过简洁的层定义轻松完成镀膜操作，具备离子束预清洗和样品加热功能。虽无公开详细参数，但从功能可知，其能稳定控制蒸发过程，保证薄膜沉积的质量。设备大概率配备高精度的温度控制系统，以精准调控蒸发源温度，实现对膜厚的有效控制 。

Product Name: ULVAC EI - 5Purpose: This is a high - vacuum evaporation system used for depositing metal and oxide thin films on a variety of substrates. It can achieve the preparation of single - layer films or multi - material stacked films (such as co - electron beam evaporation). It is suitable for fields such as materials research, semiconductor manufacturing, and optical component preparation. For example, it is used to deposit metal electrodes in semiconductor chip manufacturing and to prepare optical films in optical lens production.Performance: Film deposition operations can be easily completed through simple layer definitions, and it has ion - beam pre - cleaning and sample heating functions. Although there are no publicly available detailed parameters, it can be known from the functions that it can stably control the evaporation process to ensure the quality of thin - film deposition. The equipment is likely to be equipped with a high - precision temperature control system to precisely regulate the temperature of the evaporation source and effectively control the film thickness.