爱发科 ULVAC Ceraus ZX - 1000用途：这是一款磁控溅射系统，适用于 8 英寸（200mm）晶圆，可用于大规模生产场景。在半导体制造领域，能够进行多种薄膜沉积工艺，如在芯片制造中，可沉积金属电极、阻挡层、绝缘层等薄膜，满足半导体器件的工艺需求；也可用于制备铁电材料薄膜，应用于非易失性随机存取存储器（FRAM）等产品制造 。性能：采用独特的磁控溅射技术，能实现优异的薄膜质量与均匀性。系统配备 12 英寸靶材，可在 6 英寸和 8 英寸晶圆上进行沉积作业。拥有多个功能腔室，如用于预清洗的腔室、用于沉积钛（Ti）/ 氮化钛（TiN）、铝（Al）等不同材料的腔室。还具备回流（reflow）、脱气（degas）等功能腔室。配备涡轮泵（如 TMP 202 LM）和低温泵（如 Cryo - T 8 S 等），确保系统达到并维持高真空环境 。

Product Name: ULVAC Ceraus ZX - 1000Purpose: This is a magnetron sputtering system suitable for 8 - inch (200mm) wafers and can be used in large - scale production scenarios. In the semiconductor manufacturing field, it can perform a variety of thin - film deposition processes. For example, in chip manufacturing, it can deposit thin films such as metal electrodes, barrier layers, and insulating layers to meet the process requirements of semiconductor devices. It can also be used to prepare ferroelectric material thin films for the manufacture of products such as non - volatile random access memories (FRAM).Performance: It adopts a unique magnetron sputtering technique to achieve excellent film quality and uniformity. The system is equipped with a 12 - inch target and can perform deposition operations on 6 - inch and 8 - inch wafers. It has multiple functional chambers, such as a pre - cleaning chamber, chambers for depositing different materials such as titanium (Ti)/titanium nitride (TiN), aluminum (Al), etc. It also has functional chambers such as reflow and degas. Equipped with a turbo pump (such as TMP 202 LM) and a cryo pump (such as Cryo - T 8 S, etc.) to ensure that the system reaches and maintains a high - vacuum environment.