CHA Mark 50 高真空沉积系统用途：已成为高真空沉积系统的行业标准，适用于从计算机控制到手动操作、从大规模生产到纳米级研发等广泛应用场景，尤其在半导体金属化领域表现出色。性能：拥有 32 英寸 ×32 英寸的水平水冷圆柱形腔室，装卸简便。可搭载市面上任意类型的蒸发源。能配备高达 16 千瓦的石英灯加热器，使晶圆温度超 500°C 。可选配离子束源，在沉积前对基板表面进行预清洁，去除水汽和其他物质，沉积过程中蚀刻表面，提升薄膜质量，受光学镀膜领域欢迎。还可选配层流附件，在腔室门上方形成过滤空气幕，允许在环境控制不那么严格的场所安装。可处理 4 英寸、6 英寸、8 英寸晶圆，6 英寸晶圆载具每次可装载 24 片，8 英寸则为 15 片 。

Product Name: CHA Mark 50 High-Vacuum Deposition SystemPurpose: It has become the industry standard for high-vacuum deposition systems and is suitable for a wide range of applications, from computer-controlled to manual operation, from mass production to nano-scale research and development, especially outstanding in the field of semiconductor metallization.Performance: It has a 32-inch × 32-inch horizontal water-cooled cylindrical chamber for easy loading and unloading. It can be equipped with any type of evaporation source available on the market. It can be equipped with quartz lamp heaters of up to 16 kW to heat wafers to over 500°C. An optional ion beam source can be used to pre-clean the substrate surface before deposition, removing water vapor and other substances, and etching the surface during deposition to improve film quality, which is popular in the optical coating field. An optional laminar flow attachment can form a curtain of filtered air above the chamber door, allowing installation in less strictly controlled environments. It can handle 4-inch, 6-inch, and 8-inch wafers. The 6-inch wafer carrier can load 24 wafers each time, and the 8-inch one can load 15 wafers.