ANELVA C 3040 溅射装置用途：常用于硬盘制造领域，可在盘状基片上沉积较大厚度的薄膜，也适用于玻璃基板等的处理，如 2.5 英寸硬盘形状的玻璃基板。能在磁记录介质制造中，为非磁性衬底进行薄膜沉积 。性能：具备真空室，可将内部排气至最终真空度达 1×10⁻⁵Pa 。拥有拾取和放置系统，通过 x - 机器人和阻尼拾取器从缓冲台向载体面板传送盘。配备主腔体、入口和出口加载锁、基片加载和卸载台以及多个处理站，能实现基片的传送与处理 。

Product Name: ANELVA C 3040 Sputtering DevicePurpose: It is often used in the hard disk manufacturing field and can deposit relatively thick films on disk - shaped substrates. It is also suitable for the processing of glass substrates, such as 2.5 - inch hard - disk - shaped glass substrates. In the manufacturing of magnetic recording media, it can deposit thin films on non - magnetic substrates.Performance: It has a vacuum chamber that can exhaust the interior to a final vacuum degree of 1×10⁻⁵Pa. It has a pick - and - place system that uses an x - robot and a damped picker to transfer disks from the buffer table to the carrier panel. It is equipped with a main chamber, inlet and outlet load locks, substrate loading and unloading stations, and multiple processing stations, which can realize the transfer and processing of substrates.