爱发科 ULVAC EX - 550用途：这是一款在半导体、科研等领域发挥重要作用的设备。在半导体制造中，主要用于特定材料的刻蚀加工，像功率器件、LED、光通信及传感器等产品生产都会用到它。通过在高真空环境下，利用 RF 高频放电产生等离子体，在偏压作用下，借助物理和化学手段对材料进行精准去除。在高校及研究所中，它也是进行相关材料研究和工艺开发的得力工具 。性能：虽然公开参数有限，但基于爱发科技术实力推测，它可能配备先进的等离子体源，能产生高密度、低电子温度且压力可控的等离子体，从离子性蚀刻到自由基性蚀刻，可实现宽范围的等离子体控制，满足多样化工艺需求。设备搭载防止 RF 投入窗沉积物附着的 “Star 电极”，具备加热功能，确保了工艺的再现性和稳定性。其输送机器人可靠性高，装置构造简单，维护便捷 。

Product Name: ULVAC EX - 550Purpose: This is a device that plays a crucial role in semiconductor and research fields. In semiconductor manufacturing, it is mainly used for the etching of specific materials and is applied in the production of products such as power devices, LEDs, optical communications, and sensors. In a high - vacuum environment, RF high - frequency discharge is used to generate plasma. Under the action of bias voltage, materials are precisely removed by physical and chemical means. In universities and research institutes, it is also a powerful tool for related material research and process development.Performance: Although there are limited public parameters, based on ULVAC's technical strength, it is inferred that it may be equipped with an advanced plasma source capable of generating high - density, low - electron - temperature, and pressure - controllable plasma. It can achieve a wide range of plasma control from ionic etching to radical etching, meeting diverse process requirements. The device is equipped with a "Star electrode" to prevent the deposition of materials on the RF input window and has a heating function to ensure the reproducibility and stability of the process. Its transfer robot has high reliability, the device structure is simple, and maintenance is convenient.