爱发科 ULVAC EI - 501z用途：这是一款 Batch 式高真空蒸发设备，适用于在基板上沉积金属膜或氧化物膜。可用于研发及小批量生产场景，能够处理多种蒸发材料，如金属、ITO、二氧化硅等，在材料研究、半导体制造等领域广泛应用，例如用于制备半导体芯片的金属电极薄膜 。性能：通过操作面板可实现集中控制，将抽真空、成膜等作业集中自动化操作。镀膜精度可达 10⁻¹⁰m ，蒸发镀膜纯度高、附着力强。镀膜均匀性好且重复性优异。设备支持配置离子源进行表面处理，还可配备热阻蒸发装置，节省材料。具备上位通信及材料扫描功能 。

Product Name: ULVAC EI - 501zPurpose: This is a Batch - type high - vacuum evaporation equipment, suitable for depositing metal films or oxide films on substrates. It can be used in R & D and small - batch production scenarios and can handle a variety of evaporation materials, such as metals, ITO, silica, etc. It is widely used in fields such as materials research and semiconductor manufacturing, for example, for preparing metal electrode films for semiconductor chips.Performance: Centralized control can be achieved through the operation panel, and operations such as vacuum pumping and film formation can be centrally automated. The film - coating accuracy can reach 10⁻¹⁰m. The evaporation - coated films have high purity and strong adhesion. The film - coating uniformity is good and the repeatability is excellent. The equipment supports the configuration of an ion source for surface treatment and can also be equipped with a thermal resistance evaporation device to save materials. It has upper - level communication and material scanning functions.