爱发科 ULVAC SDP - S 1550VM用途：作为一款溅射设备，广泛应用于半导体、光学、平板显示等行业。在半导体芯片制造中，可进行金属电极、绝缘层等薄膜的溅射沉积；在光学领域，助力光学镜片增透膜、反射膜等的制备；在平板显示行业，为透明导电膜等关键薄膜的生产提供支持 。性能：虽暂未获取公开的具体参数，但基于爱发科的技术实力推测，该设备具备高效真空系统，能快速营造高真空环境，保障薄膜溅射质量。其溅射源稳定性良好，可精准调控溅射速率，确保薄膜厚度均匀，偏差极小。同时，设备可能配备自动化的晶圆传送系统，以提升生产效率，实现高效连续生产 。

Product Name: ULVAC SDP - S 1550VMPurpose: As a sputtering device, it is widely used in industries such as semiconductors, optics, and flat panel displays. In semiconductor chip manufacturing, it can perform sputter deposition of thin films such as metal electrodes and insulating layers. In the optical field, it helps in the preparation of anti - reflection coatings, reflective coatings, etc. on optical lenses. In the flat panel display industry, it provides support for the production of key thin films such as transparent conductive films.Performance: Although specific public parameters are not available for the moment, based on ULVAC's technical strength, this device is inferred to have an efficient vacuum system that can quickly create a high - vacuum environment to ensure the quality of thin - film sputtering. Its sputtering source has good stability and can precisely control the sputtering rate, ensuring uniform film thickness with a minimal deviation. At the same time, the device may be equipped with an automated wafer transfer system to improve production efficiency and achieve efficient continuous production.