日立 HITACHI E-1045 精密离子溅射仪用途：主要用于各类样品表面处理，通过离子溅射在样品表面镀上一层薄膜，从而改善样品的导电性，减少电子束照射下的电荷积累，避免样品损伤，广泛应用于扫描电镜、透射电镜等微观分析前的样品制备。性能：具备全自动操作功能，操作便捷。最大可处理直径 60mm 的样品。能溅射多种靶材，且配备暗碳附件。该设备可实现精密离子溅射，对样品损伤极小，能确保制备出高质量的样品，满足科研及工业生产中对微观分析样品的严格要求 。

Product Name: Hitachi HITACHI E-1045 Precision Ion Sputtering CoaterPurpose: It is mainly used for the surface treatment of various samples. A thin film is deposited on the sample surface through ion sputtering, which can improve the conductivity of the sample, reduce charge accumulation under electron beam irradiation, and avoid sample damage. It is widely used in sample preparation before microscopic analysis such as scanning electron microscopy and transmission electron microscopy.Performance: It has a fully automatic operation function, which is convenient to use. It can process samples with a maximum diameter of 60mm. It can sputter a variety of targets and is equipped with a dark carbon attachment. This equipment can achieve precise ion sputtering with minimal damage to the sample, ensuring the preparation of high-quality samples to meet the strict requirements for microscopic analysis samples in scientific research and industrial production.