AMAT/APPLIED MATERIALS Precision 5000 多腔室晶圆处理平台用途：适用于半导体制造领域，可对 4 英寸、5 英寸、6 英寸或 8 英寸的晶圆进行顺序处理。支持多种关键工艺，如化学气相沉积（CVD）中的自对准化学气相沉积（SACVD）、氮化硼化学气相沉积（BW CVD）等，以及刻蚀、光刻胶去除和晶圆钝化等 。性能：采用单晶圆、多腔室设计，最多可配备 4 个独立的工艺腔室，各腔室可进行不同工艺。在低真空环境下工作，能有效减少杂质干扰。具备高精度的工艺控制能力，例如对气体流量、温度、压力等参数可精准调节，保障工艺的稳定性与一致性 。

Product Name: AMAT/APPLIED MATERIALS Precision 5000 Multi - Chamber Wafer Processing PlatformPurpose: It is suitable for the semiconductor manufacturing field and can perform sequential processing on wafers of 4 - inch, 5 - inch, 6 - inch, or 8 - inch. It supports a variety of key processes, such as self - aligned chemical vapor deposition (SACVD), boron nitride chemical vapor deposition (BW CVD) in chemical vapor deposition (CVD), as well as etching, photoresist removal, and wafer passivation.Performance: It adopts a single - wafer, multi - chamber design and can be equipped with up to 4 independent process chambers, and different processes can be carried out in each chamber. It works in a low - vacuum environment, which can effectively reduce impurity interference. It has high - precision process control capabilities, for example, it can precisely adjust parameters such as gas flow, temperature, and pressure to ensure the stability and consistency of the process.