贝克休斯 GE PHOENIX Nanomex 180 纳米聚焦 X 射线显微镜用途：适用于材料科学、半导体及生命科学领域，对纳米级结构进行三维成像与分析，可观察微观缺陷、界面结构及纳米颗粒分布，满足高分辨率微观表征需求。技术原理：采用纳米聚焦 X 射线源，通过透射成像与断层扫描技术，结合高灵敏度探测器捕捉微弱信号，经三维重构算法生成样品内部纳米级结构的立体图像。性能：空间分辨率达 50nm，最大放大倍数 100000×。X 射线源电压 8-180kV，探测器像素尺寸 5μm。样品台行程 100×100×50mm，支持 - 150℃至 150℃温控，三维重构时间＜30 分钟。

Product Name: Baker Hughes GE PHOENIX Nanomex 180 Nanofocus X-ray MicroscopeUsage: Suitable for materials science, semiconductor and life sciences, conducting 3D imaging and analysis of nanoscale structures. It can observe micro-defects, interface structures and nanoparticle distribution, meeting high-resolution micro-characterization needs.Technical Principle: Uses nanofocus X-ray source, through transmission imaging and tomography, combined with high-sensitivity detector to capture weak signals, generating 3D images of nanoscale internal structures via 3D reconstruction algorithms.Performance: Spatial resolution up to 50nm, maximum magnification 100000×. X-ray source voltage 8-180kV, detector pixel size 5μm. Sample stage travel 100×100×50mm, supports -150℃ to 150℃ temperature control, 3D reconstruction time ＜30 minutes.