日本理学 RIGAKU Wafer X-300用途：适用于半导体行业，为晶圆 X 射线衍射仪，用于硅片等晶圆的结晶质量检测、晶格常数测量及缺陷分析，助力半导体器件制造过程中的质量控制。技术原理：基于 X 射线衍射原理，X 射线照射晶圆表面，晶体产生特定衍射信号，探测器采集衍射数据，通过分析信号强度与角度分布，评估晶圆结晶特性。性能：支持 200mm 及 300mm 晶圆检测；角度分辨率达 0.0001°；扫描速度最快 50°/min；配备自动晶圆传输系统，单次检测时间≤3 分钟，重复性误差≤0.001°。

Product Name: RIGAKU Wafer X-300Purpose: Suitable for the semiconductor industry, it is a wafer X-ray diffractometer used for crystalline quality inspection, lattice constant measurement and defect analysis of silicon wafers and other wafers, aiding quality control in semiconductor device manufacturing.Technical Principle: Based on the principle of X-ray diffraction, X-rays irradiate the wafer surface, and the crystal generates specific diffraction signals. The detector collects diffraction data, and the crystalline characteristics of the wafer are evaluated by analyzing the signal intensity and angle distribution.Performance: Supports 200mm and 300mm wafer inspection; angular resolution up to 0.0001°; maximum scanning speed 50°/min; equipped with automatic wafer transfer system, single detection time ≤3 minutes, repeatability error ≤0.001°.