应用材料 AMAT/APPLIED MATERIALS Quantum X Plus 离子注入机与监测设备用途：专为半导体大规模生产中的离子注入工艺设计，可精准控制离子注入过程，满足芯片制造中对高性能、高良品率的严苛要求，适用于逻辑芯片与存储芯片的生产制造环节。性能：具备高达 1.2 毫安的束流，可满足高能量处理需求；拥有先进的二维平行扫描与高精度角度控制技术，扫描速度可达 1000 - 5000 赫兹，剂量率为 4 - 7dpa / 分钟 ，能实现精准的离子注入；独特的中性束分散设备扩大了离子注入覆盖面积，集成的高容差主动中性束整形系统减少了锥度效应与不均匀注入；配备多种传感器实时反馈环境条件，还有强大的安全单元，保障操作人员安全；自带高端软件包，可实现自动化控制。

Product Name: AMAT/APPLIED MATERIALS Quantum X Plus Ion Implanter & MonitorPurpose: Specifically designed for the ion implantation process in large - scale semiconductor production, it can precisely control the ion implantation process, meeting the strict requirements for high - performance and high - yield in chip manufacturing. It is suitable for the production and manufacturing of logic chips and memory chips.Performance: It has a beam current of up to 1.2 milliamperes to meet high - energy processing needs. It is equipped with advanced two - dimensional parallel scanning and high - precision angle control technology, with a scanning speed of 1000 - 5000 Hz and a dose rate of 4 - 7 dpa/min, enabling precise ion implantation. The unique neutral beam dispersion equipment expands the ion implantation coverage area, and the integrated high - tolerance active neutral beam - shaping system reduces taper effects and non - uniform implantation. It is equipped with a variety of sensors to provide real - time feedback on environmental conditions and has a powerful safety unit to ensure the safety of operators. It also comes with high - end software packages to achieve automated control.