KOKUSAI ELECTRIC DJ - 1226V - DF 低压化学气相沉积炉用途：适用于半导体制造领域，主要用于 300mm（12 英寸）晶圆的低压化学气相沉积（LPCVD）工艺。可在晶圆表面沉积多晶硅等薄膜，用于制造集成电路、芯片等半导体器件，通过精确控制沉积过程，形成符合要求的半导体结构 。性能：制造于 2006 年。作为垂直式低压化学气相沉积系统，能精准控制工艺条件。虽具体参数有限，但通常此类设备具备良好的温度均匀性，以保证薄膜沉积的一致性。可精确控制气体流量和压力，确保反应气体在炉内均匀分布，实现高质量薄膜沉积。能够适应大规模生产需求，具备高效的晶圆处理能力 。

Product Name: KOKUSAI ELECTRIC DJ - 1226V - DF Low - Pressure Chemical Vapor Deposition FurnacePurpose: It is suitable for the semiconductor manufacturing field and is mainly used for the low - pressure chemical vapor deposition (LPCVD) process of 300mm (12 - inch) wafers. It can deposit thin films such as polysilicon on the wafer surface for the manufacture of semiconductor devices such as integrated circuits and chips. By precisely controlling the deposition process, a semiconductor structure that meets the requirements is formed.Performance: It was manufactured in 2006. As a vertical low - pressure chemical vapor deposition system, it can precisely control the process conditions. Although specific parameters are limited, generally, such equipment has good temperature uniformity to ensure the consistency of film deposition. It can accurately control the gas flow rate and pressure to ensure the uniform distribution of reaction gases in the furnace and achieve high - quality film deposition. It can meet the needs of large - scale production and has an efficient wafer processing capacity.