东京电子 TEL ALPHA - 303i - K 扩散炉用途：主要应用于半导体制造领域，用于执行扩散、氧化、沉积等关键工艺。可在晶圆上精准形成特定的半导体结构，助力生产各类高性能半导体器件，如集成电路芯片、光电器件等 。性能：配备 30 英寸直径的石英基座，能容纳较大尺寸晶圆。最高工作温度可达 1350°C，且具备精确的温度控制能力，温度均匀性优于 ±1°C。可营造氧化和还原环境，使用超高纯度的氢气、氮气和氩气，确保扩散和氧化工艺结果的高度重复性。内置坩埚和晶圆升降装置，能平稳、精准地将晶圆和坩埚移动至最佳生产位置。拥有特殊的远程访问控制软件，支持通过网络远程操作和数据监测，还配备用户友好的前端软件，便于现场实时控制 。

Product Name: TEL ALPHA - 303i - K Diffusion Furnace by Tokyo ElectronPurpose: It is mainly applied in the semiconductor manufacturing field, used to perform key processes such as diffusion, oxidation, and deposition. It can precisely form specific semiconductor structures on wafers, helping to produce various high - performance semiconductor devices, such as integrated circuit chips and optoelectronic devices.Performance: It is equipped with a 30 - inch diameter quartz susceptor, which can accommodate large - sized wafers. The maximum operating temperature can reach 1350°C, and it has precise temperature control capabilities with temperature uniformity better than ±1°C. It can create oxidizing and reducing environments, using ultra - high - purity hydrogen, nitrogen, and argon to ensure the high repeatability of diffusion and oxidation process results. It has built - in crucibles and wafer lifting devices that can move wafers and crucibles smoothly and accurately to the optimal production position. It has special remote access control software, supporting remote operation and data monitoring through the network, and is also equipped with user - friendly front - end software for on - site real - time control.