产品名称：松下 PANASONIC PSX307 平行平板型等离子清洁机用途：用于基板的清洁和表面改性，通过提升封装工序中的贴合性与接合性，助力通信、车载元件等实现高品质制造，适用于半导体制造等相关行业。技术原理：运用平行平板射频背溅射法，利用等离子体的活性对基板表面进行处理。可选择氩气（Ar）进行放电，还能选择氧气（O₂）作为选项。通过等离子体与基板表面物质发生物理或化学反应，去除污染物并对表面进行改性 。性能：基板尺寸方面，S 型选项下为长 50× 宽 20 至长 250× 宽 75mm；M 型选项下为长 50× 宽 20 至长 330× 宽 120mm，厚度范围是 0.5 - 2.0mm。设备功率为单相交流 200V，2.00kVA（满载 5.00kVA），气源要求 0.49MPa 以上，6.5L/min（A.N.R.）。尺寸约为宽 930× 深 1100× 高 1450mm，质量 555kg （不同配置下尺寸和质量会有变化）。其平行板腔技术能实现比传统批量系统更好的蚀刻均匀性，每小时可处理多达 360 个基板 / 条带，具备等离子监测功能以抑制异常放电 。Product Name: Panasonic PANASONIC PSX307 Parallel Plate Plasma CleanerPurpose: It is used for the cleaning and surface modification of substrates. By improving the adhesion and bonding in the packaging process, it helps to achieve high - quality manufacturing of communication, automotive components, etc., and is suitable for semiconductor manufacturing and related industries.Technical Principle: It uses the parallel plate RF back - sputtering method and utilizes the activity of plasma to treat the substrate surface. Argon (Ar) can be selected for discharge, and oxygen (O₂) can also be selected as an option. Physical or chemical reactions occur between the plasma and the substances on the substrate surface to remove contaminants and modify the surface.Performance: In terms of substrate size, under the S - type option, it is 50mm in length × 20mm in width to 250mm in length × 75mm in width; under the M - type option, it is 50mm in length × 20mm in width to 330mm in length × 120mm in width, and the thickness range is 0.5 - 2.0mm. The equipment power is single - phase AC 200V, 2.00kVA (5.00kVA at full load), and the air source requirement is above 0.49MPa, 6.5L/min (A.N.R.). The size is approximately 930mm in width × 1100mm in depth × 1450mm in height, and the mass is 555kg (the size and mass will vary under different configurations). Its parallel plate chamber technology can achieve better etch uniformity than traditional batch systems, and it can process up to 360 substrates/strips per hour and has a plasma monitoring function to suppress abnormal discharges.