产品名称：东电电子 TEL/TOKYO ELECTRON TERRESTA MB用途：该设备主要用于半导体制造中的晶圆清洗环节，能有效去除晶圆表面各类颗粒、有机物、金属污染物等，确保晶圆表面洁净度，为后续芯片制造工艺提供良好基础，提升芯片制造的良品率。性能：具备先进的清洗技术，可适应不同尺寸晶圆，尤其在主流的 12 英寸晶圆清洗上表现出色。采用多种清洗工艺组合，如兆声波清洗能高效去除微小颗粒，刷洗技术针对顽固污染物。清洗过程中，可精准控制清洗液流量、温度、压力等参数，确保清洗效果稳定且一致。设备的自动化程度高，拥有高效的传输系统，能快速完成晶圆上下料，极大提高生产效率，每小时可处理大量晶圆，满足大规模半导体制造的需求。Product Name: TEL/TOKYO ELECTRON TERRESTA MBPurpose: This equipment is mainly used for wafer cleaning in semiconductor manufacturing. It can effectively remove various particles, organic substances, and metal contaminants from the wafer surface, ensuring the cleanliness of the wafer surface, providing a good foundation for subsequent chip manufacturing processes, and improving the yield of chip manufacturing.Performance: It is equipped with advanced cleaning technologies and can adapt to wafers of different sizes, especially performing well in the cleaning of mainstream 12-inch wafers. It adopts a combination of multiple cleaning processes. For example, megasonic cleaning can efficiently remove tiny particles, and the brushing technology is aimed at stubborn contaminants. During the cleaning process, parameters such as the flow rate, temperature, and pressure of the cleaning solution can be precisely controlled to ensure stable and consistent cleaning effects. The equipment has a high degree of automation and an efficient transmission system, which can quickly complete wafer loading and unloading, greatly improving production efficiency. It can process a large number of wafers per hour to meet the needs of large-scale semiconductor manufacturing.