产品名称：东电电子 TEL/TOKYO ELECTRON NS300＋用途：这是一款用于半导体制造的晶圆清洗设备，主要用于清除晶圆正面、背面及边缘的缺陷和污染物，能为后续工艺提供洁净的晶圆表面，提升芯片制造良率。性能：基于东电电子领先的涂胶显影平台，具备卓越的可靠性与稳定性。采用 8 腔室设计，处理 300mm 晶圆时，每小时吞吐量可达 1000 片。运用雾化喷淋 2（AS 2）和毛刷技术，能有效减少工艺过程中的表面损伤。同时新增机械毛刷与化学辅助的边缘清洗功能，可应对因器件几何尺寸缩小，晶圆边缘缺陷位移至有效区域影响良率的问题。与前代 4 腔室型号相比，占地面积相当，但产能翻倍，且在用水和用电上分别减少 42% 和 51% 。Product Name: TEL/TOKYO ELECTRON NS300＋Purpose: This is a wafer cleaning equipment for semiconductor manufacturing, mainly used to remove defects and contaminants on the front, back and bevel of wafers. It can provide a clean wafer surface for subsequent processes and improve the yield of chip manufacturing.Performance: Based on TEL's leading coater/developer platform, it has excellent reliability and stability. With an 8-chamber design, it can achieve a throughput of 1,000 wafers per hour when processing 300mm wafers. Using Atomized Spray 2 (AS 2) and brush technologies, it can effectively reduce surface damage during the process. At the same time, it adds mechanical brush and chemical-assisted bevel cleaning functions to address the issue that as device geometries continue to shrink, bevel defects are increasingly displaced to the active area of the wafer, affecting the yield. Compared with the previous 4-chamber model, it has a comparable footprint, but doubles the productivity, and reduces water and electricity consumption by 42% and 51% respectively.