产品名称：东电电子 TEL/TOKYO ELECTRON CELIESTA+用途：这是一款晶圆及掩模清洗设备，主要用于半导体行业中，对光刻掩模和晶圆进行精确、可靠的清洗。可有效去除掩模和晶圆表面的颗粒、污染物等，保障后续工艺顺利进行，提升产品良率。性能：该设备适用于 12 英寸晶圆，具备 8 个旋转清洗单元（SVOs）和 4 个旋转单元。配置有 SC1、SC2 清洗单元，用于不同清洗步骤。设有 HF（1:10）清洗单元、臭氧清洗单元（数量为 4）、超纯水旋转清洗单元（数量为 8）等。还具备二氧化碳注入单元、臭氧发生器及尾气处理装置。拥有 SC1、SC2 及 HF（1:10）浓度监测器，可精准控制清洗液浓度，N2 流量控制器保障工艺稳定。采用三步清洗流程，第一步化学预处理；第二步用精确均匀的喷嘴喷射蚀刻液，在不损伤晶圆的前提下溶解污染物；第三步利用高能束蒸发蚀刻液实现干燥，还配备脱氧模块，通过紫外线减少残留污染物 。Product Name: TEL/TOKYO ELECTRON CELIESTA+Purpose: This is a wafer and mask cleaning equipment, mainly used for precise and reliable cleaning of photomasks and wafers in the semiconductor industry. It can effectively remove particles, contaminants, etc. from the surfaces of masks and wafers, ensuring the smooth progress of subsequent processes and improving product yield.Performance: This equipment is suitable for 12-inch wafers and is equipped with 8 Spin Vortex Oscillator (SVO) units and 4 spin units. It has SC1 and SC2 cleaning units for different cleaning steps, as well as a HF (1:10) cleaning unit, 4 ozone cleaning units, 8 ultra-pure water spin cleaning units, etc. It also has a CO₂ injection unit, an ozone generator with an ozone killer. There are concentration monitors for SC1, SC2 and HF (1:10) to precisely control the concentration of cleaning solutions, and an N₂ flow controller to ensure process stability. It adopts a three-step cleaning process. The first step is chemical pre-treatment; the second step is to spray the etching solution with a precise and uniform nozzle to dissolve contaminants without damaging the wafer; the third step is to use high-energy beams to evaporate the etching solution for drying. It is also equipped with a deoxidation module to reduce residual contaminants by ultraviolet radiation.