产品名称：应用材料 AMAT/APPLIED MATERIALS SEMITOOL CALOGIC STI 870D用途：这是一款半导体制造设备，主要用于浅沟槽隔离（STI）工艺环节。通过对晶圆表面进行处理，精确形成浅沟槽隔离结构，在集成电路制造中实现器件之间的电气隔离，有效提升芯片的性能和可靠性，广泛应用于各类先进制程的芯片生产 。性能：虽然具体参数未全面公开，但从应用材料在半导体设备领域的领先地位推测，该设备在沟槽刻蚀深度控制上精度极高，可确保沟槽深度误差在极小范围内，保障隔离效果的一致性。在刻蚀速率方面，具备高效稳定的特性，能在保证刻蚀质量的前提下，快速完成大量晶圆的处理，满足大规模生产需求。设备或许采用先进的气体流量和压力控制系统，可精准调控刻蚀过程中涉及的各类气体，实现对不同材料的高选择性刻蚀，同时降低对晶圆其他区域的损伤，提高芯片制造的良品率 。Product Name: AMAT/APPLIED MATERIALS SEMITOOL CALOGIC STI 870DPurpose: This is a semiconductor manufacturing equipment mainly used in the shallow trench isolation (STI) process. By processing the wafer surface, it precisely forms a shallow trench isolation structure, achieving electrical isolation between devices in integrated circuit manufacturing, effectively improving the performance and reliability of chips, and is widely used in the production of chips with various advanced processes.Performance: Although specific parameters have not been fully disclosed, inferring from the leading position of Applied Materials in the field of semiconductor equipment, this equipment has extremely high precision in trench etching depth control, ensuring that the trench depth error is within a very small range and guaranteeing the consistency of isolation effects. In terms of etching rate, it has the characteristics of high efficiency and stability. It can quickly process a large number of wafers while ensuring etching quality to meet the needs of large - scale production. The equipment may adopt an advanced gas flow and pressure control system, which can precisely regulate various gases involved in the etching process, achieve highly selective etching of different materials, and at the same time reduce damage to other areas of the wafer, improving the yield of chip manufacturing.