阿斯迈 ASM Levitor 4200 快速热处理系统用途：用于半导体制造领域，可对（透明）蓝宝石 LED 晶圆等进行退火处理，以提升 LED 器件性能，降低功耗。技术原理：运用专利的传导性热传递技术，晶圆悬浮于两块大质量模块间极薄的气垫上，模块间的气层实现超快速加热，使晶圆自定心并维持在所需工艺温度。加热与冷却过程不受晶圆发射率影响，能实现与发射率无关的晶圆加热与冷却。性能：可精准且均匀地对晶圆进行加热与冷却，工艺均匀性和重复性极佳；能处理 2 英寸、3 英寸和 4 英寸的蓝宝石晶圆，具备较高的处理通量；加热速度快，可在短时间内将晶圆加热至工艺所需的 1200 摄氏度 。

Product Name: ASM Levitor 4200 Rapid Thermal Processing SystemPurpose: It is used in the semiconductor manufacturing field. It can anneal (transparent) sapphire LED wafers and other materials to improve the performance of LED devices and reduce power consumption.Technical Principle: It uses patented conductive heat transfer technology. The wafer floats on a very thin cushion of gas between two massive blocks. The gas layer between the blocks enables ultra - fast heating, self - centers the wafer, and keeps the wafer at the desired process temperature. The heating and cooling processes are independent of the wafer's emissivity, enabling emissivity - independent wafer heating and cooling.Performance: It can accurately and uniformly heat and cool wafers, with excellent process uniformity and repeatability. It can process 2 - inch, 3 - inch, and 4 - inch sapphire wafers with a high throughput rate. It has a fast heating speed and can heat the wafer to the required process temperature of 1200 degrees Celsius in a short time.